Invention Grant
- Patent Title: Element isolation structure of a solid-state pickup device
- Patent Title (中): 固体拾取装置的元件隔离结构
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Application No.: US13360356Application Date: 2012-01-27
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Publication No.: US08952428B2Publication Date: 2015-02-10
- Inventor: Masahiro Kobayashi
- Applicant: Masahiro Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc. IP Division
- Priority: JP2011-026351 20110209
- Main IPC: H01L27/148
- IPC: H01L27/148 ; H01L27/146

Abstract:
An N-type semiconductor region and a floating diffusion region are disposed in an active region. A transfer gate electrode for transferring charges from a PD to an FD is disposed on a semiconductor substrate through an insulator. A part of the N-type semiconductor region constituting the PD and a part of the transfer gate electrode are overlapped with each other. A P-type semiconductor region is disposed in the active region. The P-type semiconductor region and the portion overlapped with the transfer gate electrode of the N-type semiconductor region are disposed adjacent to each other in the direction parallel to the interface of the semiconductor substrate and the insulator. The position of the impurity concentration peak of the N-type semiconductor region and the position of the impurity concentration peak of the P-type semiconductor region are different from each other in depth.
Public/Granted literature
- US08901617B2 Element isolation structure of a solid-state pickup device Public/Granted day:2014-12-02
Information query
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