发明授权
- 专利标题: Developing method
- 专利标题(中): 开发方法
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申请号: US13359388申请日: 2012-01-26
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公开(公告)号: US08956695B2公开(公告)日: 2015-02-17
- 发明人: Masahiko Harumoto , Akira Yamaguchi , Akihiro Hisai , Minoru Sugiyama , Takuya Kuroda
- 申请人: Masahiko Harumoto , Akira Yamaguchi , Akihiro Hisai , Minoru Sugiyama , Takuya Kuroda
- 申请人地址: JP Kyoto
- 专利权人: SCREEN Semiconductor Solutions Co., Ltd.
- 当前专利权人: SCREEN Semiconductor Solutions Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: Kilpatrick Townsend & Stockton LLP
- 优先权: JP2007-271366 20071018
- 主分类号: B05D3/12
- IPC分类号: B05D3/12 ; G03C5/29 ; G03F7/20 ; G03F7/30
摘要:
A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.
公开/授权文献
- US20120122038A1 DEVELOPING APPARATUS 公开/授权日:2012-05-17
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