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公开(公告)号：US08956695B2
公开(公告)日：2015-02-17
申请号：US13359388
申请日：2012-01-26
CPC分类号： G03F7/30 , B05D1/005 , G03F7/2041 , G03F7/3021 , H01L21/6715
摘要： A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.
摘要翻译： 用于显影衬底的方法包括用旋转保持器旋转衬底并将显影剂从显影剂供给器上排列成排的多个排气口排出到衬底。 该方法还包括使移动机构在平面图中沿着延伸到基板中心的一个方向移动所述显影剂供给器，同时保持所述排气口在所述一个方向上的布置方向，从而使所述显影剂进料器基本上 中心和基底的边缘。 所述方法还包括使从所述排气口排出的显影剂在基板上分离的流中撞击，并使每一个分离的流在基板上螺旋地冲击，从而显影基板。 对应于所述排气口的显影剂冲击位置的至少两个轨迹彼此重叠。
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公开(公告)号：US20120122038A1
公开(公告)日：2012-05-17
申请号：US13359388
申请日：2012-01-26
IPC分类号： G03F7/30
CPC分类号： G03F7/30 , B05D1/005 , G03F7/2041 , G03F7/3021 , H01L21/6715
摘要： A method for developing a substrate includes spinning the substrate with a spin holder and discharging a developer to the substrate from a plurality of exhaust ports arranged in a row on a developer feeder. The method also includes causing a moving mechanism to move said developer feeder in one direction extending to a center of the substrate in plan view while maintaining a direction of arrangement of said exhaust ports in said one direction, thereby to move said developer feeder between substantially the center and an edge of the substrate. The method further includes causing the developer discharged from said exhaust ports to impinge in separate streams on the substrate, and causing each of the separate streams to impinge spirally on the substrate, thereby to develop the substrate. At least two of loci of positions of impingement of the developer corresponding to said exhaust ports overlap each other.
摘要翻译： 用于显影衬底的方法包括用旋转保持器旋转衬底并将显影剂从显影剂供给器上排列成排的多个排气口排出到衬底。 该方法还包括使移动机构在平面图中沿着延伸到基板中心的一个方向移动所述显影剂供给器，同时保持所述排气口在所述一个方向上的布置方向，从而使所述显影剂进料器基本上 中心和基底的边缘。 所述方法还包括使从所述排气口排出的显影剂在基板上分离的流中撞击，并使每一个分离的流在基板上螺旋地冲击，从而显影基板。 对应于所述排气口的显影剂冲击位置的至少两个轨迹彼此重叠。
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公开(公告)号：US20090103960A1
公开(公告)日：2009-04-23
申请号：US12252225
申请日：2008-10-15
IPC分类号： G03G15/00
CPC分类号： G03F7/30 , B05D1/005 , G03F7/2041 , G03F7/3021 , H01L21/6715
摘要： A developing apparatus disclosed includes a spin chuck for spinnably holding a substrate, a developer nozzle having a plurality of exhaust ports arranged in a row for discharging a developer, the developer nozzle causing the developer discharged from the exhaust ports to impinge in separate streams on the substrate, a horizontal movement mechanism for moving the developer nozzle in one direction extending to the center of the substrate in plan view while maintaining a direction of arrangement of the exhaust ports in the one direction, thereby to move the developer nozzle between substantially the center and an edge of the substrate in plan view, and a controller for controlling the spin chuck and horizontal movement mechanism to cause the separate streams of the developer discharged from the exhaust ports to impinge spirally on the substrate, thereby to develop the substrate.
摘要翻译： 所公开的显影装置包括用于可旋转地保持基板的旋转卡盘，具有排列成排列显影剂的多个排气口的显影剂喷嘴，使从排气口排出的显影剂的显影剂喷嘴在 衬底，用于在平面图中沿着延伸到衬底中心的一个方向移动显影剂喷嘴的水平移动机构，同时保持排气口在一个方向上的布置方向，从而使显影剂喷嘴在基本上位于中心和 在平面图中的基板的边缘，以及用于控制旋转卡盘和水平运动机构的控制器，以使从排气口排出的显影剂的分离流在螺旋状地冲击到基板上，从而显影基板。
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公开(公告)号：US08137576B2
公开(公告)日：2012-03-20
申请号：US12032582
申请日：2008-02-15
CPC分类号： G03F7/32 , G03F7/3021
摘要： A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neutralizing the developer and removing the developer from the substrate. In the neutralizing and removing step, the developer is neutralized by the treating solution. This neutralization reaction forms a product (salt) which easily melts into the treating solution and does not precipitate. Thus, the product is removable from the substrate along with the treating solution. Therefore, the developer is inhibited from remaining on the substrate. As a result, it is possible to prevent post-develop defects due to “residues of the developer” or the developer remaining on the substrate.
摘要翻译： 用于显影衬底的方法包括将显影剂供应到衬底的显影步骤，以及用于将含有中和材料的处理溶液供应到衬底以中和显影剂并中和显影剂并除去显影剂的中和和去除步骤 底物。 在中和除去步骤中，显影剂被处理溶液中和。 该中和反应形成易于熔融进入处理溶液并且不沉淀的产物（盐）。 因此，产品与处理溶液一起可从基底中除去。 因此，抑制显影剂残留在基板上。 结果，可以防止由于“残留显影剂”或残留在基材上的显影剂引起的显影后缺陷。
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公开(公告)号：US20080203058A1
公开(公告)日：2008-08-28
申请号：US12032582
申请日：2008-02-15
CPC分类号： G03F7/32 , G03F7/3021
摘要： A method for developing a substrate includes a developing step for supplying a developer to the substrate, and a neutralizing and removing step for supplying a treating solution containing a neutralizing material to the substrate to neutralize the developer, and neutralizing the developer and removing the developer from the substrate. In the neutralizing and removing step, the developer is neutralized by the treating solution. This neutralization reaction forms a product (salt) which easily melts into the treating solution and does not precipitate. Thus, the product is removable from the substrate along with the treating solution. Therefore, the developer is inhibited from remaining on the substrate. As a result, it is possible to prevent post-develop defects due to “residues of the developer” or the developer remaining on the substrate.
摘要翻译： 用于显影衬底的方法包括将显影剂供应到衬底的显影步骤，以及用于将含有中和材料的处理溶液供应到衬底以中和显影剂并中和显影剂并除去显影剂的中和和去除步骤 底物。 在中和除去步骤中，显影剂被处理溶液中和。 该中和反应形成易于熔融进入处理溶液并且不沉淀的产物（盐）。 因此，产品与处理溶液一起可从基底中除去。 因此，抑制显影剂残留在基板上。 结果，可以防止由于“残留显影剂”或残留在基材上的显影剂引起的显影后缺陷。
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6.发明申请Method and system for performing development processing during photolithography 审中-公开在光刻期间执行显影处理的方法和系统公开(公告)号：US20080090186A1
公开(公告)日：2008-04-17
申请号：US11906760
申请日：2007-10-02
申请人： Masahiko Harumoto , Akira Yamaguchi , Akhiro Hisai
发明人： Masahiko Harumoto , Akira Yamaguchi , Akhiro Hisai
IPC分类号： G03C5/29
CPC分类号： G03F7/3028 , H01L21/67028 , H01L21/6715 , H01L21/67253
摘要： A method of eliminating an occurrence of concentration differences in a developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse, preventing occurrence of stain-like defects on a resist film surface, and reducing amount of the developer used is disclosed. While a substrate is being rotated about a vertical axis by a rotation motor while held in a horizontal posture by a spin chuck, after the developer has been fed onto the resist film on the substrate surface from a developer discharge nozzle to conduct processing, the substrate continues to be rotated and thus the developer on the resist film is dispersed and removed by a centrifugal force, and when an interference fringe seen on the substrate surface is reduced in level or not present, a rinse is fed onto the resist film from a rinse discharge nozzle to conduct rinsing.
摘要翻译： 当衬底上的显影剂被冲洗替代时，消除显影剂中基于衬底表面上的位置的浓度差异的发生的方法，防止在抗蚀剂膜表面上出现污点状缺陷，并减少显影剂的量 使用被披露。 当基片通过旋转马达通过旋转马达围绕垂直轴线旋转，同时通过旋转卡盘保持在水平姿态时，在显影剂从显影剂排出喷嘴馈送到基板表面上的抗蚀剂膜上以进行处理之后，基板 继续旋转，因此抗蚀剂膜上的显影剂通过离心力被分散和去除，并且当在基底表面上看到的干涉条纹水平降低或不存在时，将冲洗液从冲洗液 排放喷嘴进行冲洗。
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7.发明申请Method and apparatus for rinsing a substrate during lithographic development processing 审中-公开用于在光刻显影处理期间漂洗基底的方法和装置公开(公告)号：US20080090185A1
公开(公告)日：2008-04-17
申请号：US11906748
申请日：2007-10-02
申请人： Masahiko Harumoto , Akira Yamaguchi , Akhiro Hisai
发明人： Masahiko Harumoto , Akira Yamaguchi , Akhiro Hisai
IPC分类号： G03F7/26
CPC分类号： G03F7/3021
摘要： The invention provides a method capable of eliminating occurrence of concentration difference in developer depending on position on a substrate surface when a developer on the substrate is replaced with a rinse; preventing occurrence of stain-like defects on a resist film surface; and reducing amount used of the developer. While a substrate is being rotated about a vertical axis by a rotation motor with held in a horizontal posture by a spin chuck, after the developer has been fed onto the resist film on the substrate surface from a developer discharge nozzle to conduct processing, the substrate continues to be rotated and thus the developer on the resist film is dispersed by a centrifugal force to be removed, and thereafter a rinse is fed onto the resist film from a rinse discharge nozzle to conduct rinsing.
摘要翻译： 本发明提供一种能够消除显影剂中当基板表面上的显影剂被冲洗更换时基板表面上的位置的出现的方法; 防止抗蚀剂膜表面上出现斑点状缺陷; 并减少显影剂的使用量。 当通过由旋转卡盘保持水平姿态的旋转马达围绕垂直轴线旋转基板时，在显影剂从显影剂排出喷嘴被供给到基板表面上的抗蚀剂膜上以进行处理之后，基板 继续旋转，因此抗蚀剂膜上的显影剂通过离心力分散以除去，然后将冲洗液从冲洗排出喷嘴供给到抗蚀剂膜上以进行漂洗。
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8.发明申请LOAD LOCK DEVICE, AND SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME 审中-公开负载锁定装置，以及基板处理装置和包括其的基板处理系统公开(公告)号：US20080025823A1
公开(公告)日：2008-01-31
申请号：US11828863
申请日：2007-07-26
申请人： Masahiko Harumoto
发明人： Masahiko Harumoto
IPC分类号： H01L21/677
CPC分类号： H01L21/67201
摘要： A load lock chamber includes a chamber. A vacuum pump is connected to the bottom of the chamber through a pipe. A cooling pipe is buried in the upper part of the chamber. One and the other ends of the cooling pipe are connected with a refrigerant circulator. When the pressure in the chamber is reduced, the chamber continues to be cooled during the period between when the pressure in the chamber becomes lower than a threshold and immediately before the inside of the chamber is released to atmospheric pressure.
摘要翻译： 负载锁定室包括室。 真空泵通过管道连接到腔室的底部。 冷却管埋在室的上部。 冷却管的一端和另一端与制冷剂循环器连接。 当腔室内的压力降低时，在室内的压力变得低于阈值之间并且在室的内部释放到大气压之前的期间，腔室继续被冷却。
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公开(公告)号：US07597491B2
公开(公告)日：2009-10-06
申请号：US11245347
申请日：2005-10-06
申请人： Masahiko Harumoto , Masakazu Sanada
发明人： Masahiko Harumoto , Masakazu Sanada
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.
摘要翻译： 将从显影剂排出喷嘴供应的显影剂的水坑放置在保持静止的基板上。 接下来，将基板保持静止一段预定的时间长度，使显影剂的熔池保持在基板上。 这导致开发反应进行。 随后，去离子水从去离子水排出喷嘴供应到基底以停止显影反应，并且基板旋转，同时使得显影剂的一部分水坑保留在基板的表面上。 这使得溶解产物易于在保留在基材表面上的显影剂中扩散以促进抗蚀剂的溶解。 执行漂洗处理和干燥处理以完成显影过程。
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公开(公告)号：US20060088791A1
公开(公告)日：2006-04-27
申请号：US11245347
申请日：2005-10-06
申请人： Masahiko Harumoto , Masakazu Sanada
发明人： Masahiko Harumoto , Masakazu Sanada
IPC分类号： H01L21/027
CPC分类号： G03F7/3021 , H01L21/6715
摘要： A puddle of developer supplied from a developer discharge nozzle is placed on a substrate held stationary. Next, the substrate is held stationary for a predetermined length of time, with the puddle of developer allowed to remain on the substrate. This causes a development reaction to proceed. Subsequently, deionized water is supplied from a deionized water discharge nozzle to the substrate to stop the development reaction, and the substrate is rotated while part of the puddle of developer is allowed to remain on the surface of the substrate. This makes a dissolution product easy to diffuse in the developer remaining on the surface of the substrate to promote the dissolution of the resist. A rinsing process and a drying process are performed to complete the development process.
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