发明授权
US08957351B2 Catalytic CVD equipment, method for formation of film, process for production of solar cell, and substrate holder
有权
催化CVD设备，薄膜形成方法，太阳能电池的制造方法以及基板支架
- 专利标题： Catalytic CVD equipment, method for formation of film, process for production of solar cell, and substrate holder
- 专利标题（中）： 催化CVD设备，薄膜形成方法，太阳能电池的制造方法以及基板支架
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申请号： US13435646申请日： 2012-03-30
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公开(公告)号： US08957351B2公开(公告)日： 2015-02-17
- 发明人: Masaki Shima , Yoshinori Wakamiya , Shuji Osono , Satohiro Okayama , Hideyuki Ogata
- 申请人： Masaki Shima , Yoshinori Wakamiya , Shuji Osono , Satohiro Okayama , Hideyuki Ogata
- 申请人地址： JP Moriguchi-shi JP Chigasaki-shi
- 专利权人： SANYO Electric Co., Ltd.,ULVAC, Inc.
- 当前专利权人： SANYO Electric Co., Ltd.,ULVAC, Inc.
- 当前专利权人地址： JP Moriguchi-shi JP Chigasaki-shi
- 代理机构： Mots Law, PLLC
- 代理商 Marvin A. Motsenbocker
- 优先权： JP2009-230589 20091002
- 主分类号： H05B3/68
- IPC分类号： H05B3/68 ; C23C16/44 ; C23C16/24 ; H01L21/687
摘要：
In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.