发明授权
US08968838B2 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation 有权
在具有梯形波形激励的电容耦合电抗器中的等离子体处理

Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
摘要:
A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
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