发明授权
US08968838B2 Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
有权
在具有梯形波形激励的电容耦合电抗器中的等离子体处理
- 专利标题: Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
- 专利标题(中): 在具有梯形波形激励的电容耦合电抗器中的等离子体处理
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申请号: US13809784申请日: 2011-07-12
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公开(公告)号: US08968838B2公开(公告)日: 2015-03-03
- 发明人: Jean-Paul Booth , Erik Johnson
- 申请人: Jean-Paul Booth , Erik Johnson
- 申请人地址: FR Palaiseau FR Paris
- 专利权人: Ecole Polytechnique,Centre National de la Recherche Scientifique
- 当前专利权人: Ecole Polytechnique,Centre National de la Recherche Scientifique
- 当前专利权人地址: FR Palaiseau FR Paris
- 代理机构: Greer, Burns & Crain, Ltd.
- 优先权: EP10169735 20100715
- 国际申请: PCT/EP2011/061894 WO 20110712
- 国际公布: WO2012/007483 WO 20120119
- 主分类号: C23C16/509
- IPC分类号: C23C16/509 ; H01J37/32
摘要:
A method is provided for exciting at least one electrode of a capacitively coupled reactive plasma reactor containing a substrate. The electrode is excited by applying a RF voltage with a trapezoidal waveform comprising a ramp-up, a high plateau, a ramp-down and a low plateau. The plasma density can be controlled by adjusting the duration of the ramp-up, the duration of the ramp-down, the amplitude and the repetition rate of the trapezoidal waveform. The ion energy distribution function at the substrate can be controlled by adjusting the amplitude and the relative duration between the high plateau and the low plateau of the trapezoidal waveform.
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