Invention Grant
- Patent Title: Fullerene-based capacitor electrode
- Patent Title (中): 富勒烯电容器电极
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Application No.: US13728026Application Date: 2012-12-27
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Publication No.: US08975134B2Publication Date: 2015-03-10
- Inventor: Sergey Barabash , Dipankar Pramanik , Xuena Zhang
- Applicant: Intermolecular, Inc.
- Applicant Address: US CA San Jose
- Assignee: Intermolecular, Inc.
- Current Assignee: Intermolecular, Inc.
- Current Assignee Address: US CA San Jose
- Main IPC: H01L21/8242
- IPC: H01L21/8242 ; H01L21/20 ; H01L29/40 ; H01L29/66 ; B82Y10/00 ; H01L29/49 ; H01L29/94

Abstract:
A doped fullerene-based conductive material can be used as an electrode, which can contact a dielectric such as a high k dielectric. By aligning the dielectric with the band gap of the doped fullerene-based electrode, e.g., the conduction band minimum of the dielectric falls into one of the band gaps of the doped fullerene-based material, thermionic leakage through the dielectric can be reduced, since the excited electrons or holes in the electrode would need higher thermal excitation energy to overcome the band gap before passing through the dielectric layer.
Public/Granted literature
- US20140183664A1 Fullerene-Based Capacitor Electrode Public/Granted day:2014-07-03
Information query
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