Invention Grant
- Patent Title: Ozone gas supply system
- Patent Title (中): 臭氧气供应系统
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Application No.: US14007048Application Date: 2011-03-24
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Publication No.: US08980189B2Publication Date: 2015-03-17
- Inventor: Shinichi Nishimura , Yoichiro Tabata
- Applicant: Shinichi Nishimura , Yoichiro Tabata
- Applicant Address: JP Tokyo
- Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Current Assignee: Toshiba Mitsubishi-Electric Industrial Systems Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- International Application: PCT/JP2011/057076 WO 20110324
- International Announcement: WO2012/127670 WO 20120927
- Main IPC: B01J19/08
- IPC: B01J19/08 ; B01J12/00 ; C01B13/11

Abstract:
In the present invention, particularly, means for removing moisture contained in a raw material gas is provided in a raw material gas supply part so that the amount of moisture contained in the raw material gas that is supplied to an ozone gas supply system is reduced, and additionally an ozone gas output flow rate management unit is provided that is configured to receive a plurality of ozone gas outputs from a plurality of nitrogen-free ozone generation units and capable of performing an ozone gas output flow rate control for selectively outputting one or a combination of two or more of the plurality of ozone gas outputs to any of a plurality of ozone treatment apparatuses by performing an opening/closing operation on a plurality of ozone gas control valves provided in the ozone gas output flow rate management unit.
Public/Granted literature
- US20140017133A1 OZONE GAS SUPPLY SYSTEM Public/Granted day:2014-01-16
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