发明授权
- 专利标题: Porous silicon particles and complex porous silicon particles, and method for producing both
- 专利标题(中): 多孔硅颗粒和复合多孔硅颗粒及其制造方法
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申请号: US13797326申请日: 2013-03-12
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公开(公告)号: US08980428B2公开(公告)日: 2015-03-17
- 发明人: Hirokazu Yoshida , Kazutomi Miyoshi , Kazuhiko Kurusu , Toshio Tani , Koji Hataya , Takeshi Nishimura , Hidemi Kato , Takeshi Wada
- 申请人: Furukawa Electric Co., Ltd. , Tohoku Techno Arch Co., Ltd.
- 申请人地址: JP Tokyo JP Miyagi
- 专利权人: Furukawa Electric Co., Ltd.,Tohoku Techno Arch Co., Ltd.
- 当前专利权人: Furukawa Electric Co., Ltd.,Tohoku Techno Arch Co., Ltd.
- 当前专利权人地址: JP Tokyo JP Miyagi
- 代理机构: Lowe Hauptman & Ham, LLP
- 优先权: JP2010-209665 20100917; JP2010-209691 20100917; JP2011-195723 20110908; JP2011-195751 20110908
- 主分类号: H01M4/04
- IPC分类号: H01M4/04 ; H01M4/36 ; H01M4/38
摘要:
Porous silicon particles and complex porous silicon particles suitable for negative electrode materials etc. for lithium-ion batteries, which achieve high capacity and good cycling characteristics, are provided. Porous silicon particles formed by the joining of a plurality of silicon microparticles, and having an average particle diameter of 0.1 μm to 1000 μm, a three-dimensional network structure having continuous gaps, an average porosity of 15 to 93%, and a structure in which the particles of a whole particle are uniform. Complex porous silicon particles formed by the joining of a plurality of silicon microparticles and a plurality of silicon compound particles, and characterized by containing a compound of silicon and composite elements, having an average particle diameter of 0.1 μm to 1000 μm, and having a three-dimensional network structure having continuous gaps.
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