发明授权
- 专利标题: Methods and systems of material removal and pattern transfer
- 专利标题(中): 材料去除和图案转移的方法和系统
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申请号: US13014508申请日: 2011-01-26
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公开(公告)号: US08980751B2公开(公告)日: 2015-03-17
- 发明人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
- 申请人: Gerard M. Schmid , Michael N. Miller , Byung-Jin Choi , Douglas J. Resnick , Sidlgata V. Sreenivasan , Frank Y. Xu , Darren D. Donaldson
- 申请人地址: US TX Austin US TX Austin
- 专利权人: Canon Nanotechnologies, Inc.,Molecular Imprints, Inc.
- 当前专利权人: Canon Nanotechnologies, Inc.,Molecular Imprints, Inc.
- 当前专利权人地址: US TX Austin US TX Austin
- 代理商 Cameron A. King
- 主分类号: H01L21/311
- IPC分类号: H01L21/311 ; H01J37/20 ; G03F7/42 ; B82Y40/00 ; B82Y10/00 ; G03F7/00
摘要:
Polymerized material on a substrate may be removed by exposure to vacuum ultraviolet (VUV) radiation from an energy source within a gaseous atmosphere of a controlled composition. Following such removal, additional etching techniques are also described for nano-imprinting.