发明授权
US08981329B1 Method of forming anneal-resistant embedded resistor for non-volatile memory application 有权
用于非易失性存储器应用的形成耐退火嵌入式电阻器的方法

Method of forming anneal-resistant embedded resistor for non-volatile memory application
摘要:
Embodiments of the invention include a nonvolatile memory device that contains nonvolatile resistive random access memory device with improved device performance and lifetime. In some embodiments, nonvolatile resistive random access memory device includes a diode, a metal silicon nitride embedded resistor, and a resistive switching layer disposed between a first electrode layer and a second electrode layer. In some embodiments, the method of forming a resistive random access memory device includes forming a diode, forming a metal silicon nitride embedded resistor, forming a first electrode layer, forming a second electrode layer, and forming a resistive switching layer disposed between the first electrode layer and the second electrode layer.
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