发明授权
- 专利标题： System for detecting motion, lithographic apparatus and device manufacturing method
- 专利标题（中）： 检测运动系统，光刻设备和装置制造方法
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申请号： US13564665申请日： 2012-08-01
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公开(公告)号： US08982359B2公开(公告)日： 2015-03-17
- 发明人: Jan Van Eijk , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen
- 申请人： Jan Van Eijk , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Petrus Martinus Bernardus Vermeulen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号： G01B11/14
- IPC分类号： G01B11/14 ; G01B11/24 ; G01D5/38 ; G03F7/20
摘要：
A system for detecting motion of a body, the system comprising: a body; a first grating mounted substantially stationary relative to a frame of reference; a second grating mounted on the body; a detector arranged to receive one or more radiation beams diffracted at the first and second gratings thereby to detect motion of the body relative to the frame of reference; wherein the detector is coupled to the body and moveable relative to the body.
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