Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object
    3.
    发明授权
    Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object 有权
    用于测量可移动物体的位置相关信号的测量系统和光刻设备

    公开(公告)号:US08457385B2

    公开(公告)日:2013-06-04

    申请号:US13019587

    申请日:2011-02-02

    IPC分类号: G06K9/00

    摘要: An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

    摘要翻译: 编码器型测量系统被配置为测量可移动物体的位置相关信号,所述测量系统包括可安装在可移动物体上的至少一个传感器,可安装在基本上固定的框架上的传感器目标物体,以及安装装置, 传感器目标物体在基本上固定的框架上。 测量系统还包括补偿装置,其被配置为补偿传感器目标物体相对于基本上静止的框架的运动和/或变形。 补偿装置可以包括无源或主动阻尼装置和/或反馈位置控制系统。 在替代实施例中,补偿装置包括夹持装置,其在可移动物体的高精度运动期间固定传感器目标物体的位置。

    LITHOGRAPHIC APPARATUS AND METHOD FOR MEASURING A POSITION
    6.
    发明申请
    LITHOGRAPHIC APPARATUS AND METHOD FOR MEASURING A POSITION 有权
    平面设备和测量位置的方法

    公开(公告)号:US20110216300A1

    公开(公告)日:2011-09-08

    申请号:US13022498

    申请日:2011-02-07

    IPC分类号: G03B27/58 G01B11/14

    摘要: A lithographic apparatus includes a support configured to hold an object, the support being moveable relative to a reference structure in a direction; a first position measurement system configured to provide a first measurement signal in a first frequency range, the first measurement signal representative of a position of the support relative to the reference structure in the direction; a second position measurement system configured to provide a second measurement signal in a second frequency range, the second measurement signal representative of the position of the support relative to the reference structure in the direction; and a processor configured to (a) filter the first measurement signal so as to attenuate a signal component having a frequency in the second frequency range, (b) filter the second measurement signal so as to attenuate a signal component having a frequency in the first frequency range, and (c) combine the filtered first measurement signal and the filtered second measurement signal into a combined measurement signal representative of the position of the support relative to the reference structure in the direction.

    摘要翻译: 光刻设备包括被配置为保持物体的支撑件,所述支撑件可相对于参考结构在一个方向上移动; 第一位置测量系统,被配置为在第一频率范围内提供第一测量信号,所述第一测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 第二位置测量系统,被配置为在第二频率范围内提供第二测量信号,所述第二测量信号表示所述支撑件相对于所述参考结构在所述方向上的位置; 以及处理器,其被配置为(a)对所述第一测量信号进行滤波,以便衰减具有在所述第二频率范围内的频率的信号分量,(b)滤除所述第二测量信号,以便衰减具有所述第一频率的信号分量 频率范围,以及(c)将滤波的第一测量信号和滤波的第二测量信号组合成表示支撑件相对于参考结构在该方向上的位置的组合测量信号。

    IMPRINT LITHOGRAPHY APPARATUS
    7.
    发明申请

    公开(公告)号:US20110008483A1

    公开(公告)日:2011-01-13

    申请号:US12821806

    申请日:2010-06-23

    IPC分类号: B29C59/00

    摘要: An imprint lithography apparatus is disclosed that includes a structure located away from a substrate holder and extending across the substrate holder, and such that an imprint template arrangement is, in use, located between the structure and the substrate holder, wherein the structure has one or more arrays of lines or one or more encoders, and the substrate or substrate holder and the imprint template have a corresponding one or more encoders that face towards one or more of the one or more arrays of lines or one or more arrays of lines that face towards one or more of the one or more encoders, and the configuration determination arrangement is configured to determine a relative configuration between the substrate or substrate holder and the structure, and/or a relative configuration between the imprint template arrangement and the structure, and/or a relative configuration between the imprint template arrangement and the substrate or substrate holder.

    摘要翻译: 公开了一种压印光刻设备,其包括远离衬底保持器并延伸穿过衬底保持器的结构,并且使得压印模板布置在使用中位于结构和衬底保持器之间,其中结构具有一个或 更多的线阵列或一个或多个编码器,并且衬底或衬底保持器和压印模板具有对应的一个或多个编码器,其面向一个或多个线阵列或一个或多个面阵列阵列 朝向一个或多个编码器中的一个或多个,并且配置确定装置被配置为确定衬底或衬底保持器与结构之间的相对配置,和/或压印模板布置和结构之间的相对配置,和/ 或压印模板布置和基板或基板保持器之间的相对配置。

    Lithographic apparatus and device manufacturing method
    9.
    发明申请
    Lithographic apparatus and device manufacturing method 失效
    平版印刷设备和器件制造方法

    公开(公告)号:US20080105026A1

    公开(公告)日:2008-05-08

    申请号:US11594230

    申请日:2006-11-08

    IPC分类号: G01B3/00

    摘要: The present invention relates to a method for calibrating a grating of an encoder measurement system between two adjacent calibrated locations, the method includes moving one of a sensor object including an encoder-type sensor and a grating along the other one of the sensor object and the grating with a speed, wherein the speed is selected such that disturbances in the grating substantially extending over a distance smaller than a distance between the two calibrated locations can not or only partly be followed by the one of the sensor object and the grating, and measuring during the moving the position of the sensor object with respect to the grating at a plurality of locations between the two calibrated locations.

    摘要翻译: 本发明涉及一种用于在两个相邻校准位置之间校准编码器测量系统的光栅的方法,所述方法包括沿着传感器对象中的另一个移动包括编码器型传感器和光栅的传感器对象中的一个, 光栅的速度,其中选择速度,使得光栅中基本上延伸的距离小于两个校准位置之间的距离的干扰不能或仅部分地由传感器对象和光栅之一进行跟踪,并且测量 在两个校准位置之间的多个位置移动传感器对象相对于光栅的位置。

    Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit
    10.
    发明授权
    Position measurement unit, measurement system and lithographic apparatus comprising such position measurement unit 有权
    位置测量单元,测量系统和包括该位置测量单元的光刻设备

    公开(公告)号:US07362446B2

    公开(公告)日:2008-04-22

    申请号:US11226460

    申请日:2005-09-15

    IPC分类号: G01B11/02

    摘要: A measurement unit to determine a position in a first and second dimension includes a diffraction type encoder and an interferometer. The diffraction type encoder determines by means of a diffraction on a first and a second diffraction grating the position in the first dimension of the second grating with respect to the first grating, The interferometer determines the position in the second dimension of a mirror. The measurement unit includes a combined optical unit to transfer an encoder measurement beam as well as an interferometer measurement beam. Further, the measurement unit may include a combined light source for the encoder as well as the interferometer. One of the first and second diffraction gratings may further show some degree of zero order reflection to provide the mirror of the interferometer.

    摘要翻译: 用于确定第一和第二维度中的位置的测量单元包括衍射型编码器和干涉仪。 衍射型编码器通过第一和第二衍射光栅上的衍射来确定第二光栅相对于第一光栅的第一维度中的位置。干涉仪确定反射镜的第二维度中的位置。 测量单元包括用于传送编码器测量光束以及干涉仪测量光束的组合光学单元。 此外,测量单元可以包括用于编码器的组合光源以及干涉仪。 第一和第二衍射光栅中的一个可进一步示出一些零级反射以提供干涉仪的反射镜。