发明授权
US08986980B2 Fabricate self-formed nanometer pore array at wafer scale for DNA sequencing
有权
制造晶圆规模的自制纳米孔阵列进行DNA测序
- 专利标题： Fabricate self-formed nanometer pore array at wafer scale for DNA sequencing
- 专利标题（中）： 制造晶圆规模的自制纳米孔阵列进行DNA测序
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申请号： US13469220申请日： 2012-05-11
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公开(公告)号： US08986980B2公开(公告)日： 2015-03-24
- 发明人: Gustavo A. Stolovitzky , Deqiang Wang
- 申请人： Gustavo A. Stolovitzky , Deqiang Wang
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Cantor Colburn LLP
- 代理商 Vazken Alexanian
- 主分类号： H01L29/02
- IPC分类号： H01L29/02 ; B82Y15/00 ; B82Y40/00 ; B82Y5/00
摘要：
A technique is provided for a structure. A substrate has a nanopillar vertically positioned on the substrate. A bottom layer is formed beneath the substrate. A top layer is formed on top of the substrate and on top of the nanopillar, and a cover layer covers the top layer and the nanopillar. A window is formed through the bottom layer and formed through the substrate, and the window ends at the top layer. A nanopore is formed through the top layer by removing the cover layer and the nanopillar.