Invention Grant
- Patent Title: Method for manufacturing display device
- Patent Title (中): 显示装置制造方法
-
Application No.: US14080822Application Date: 2013-11-15
-
Publication No.: US08987068B2Publication Date: 2015-03-24
- Inventor: Shunpei Yamazaki , Shinji Maekawa , Makoto Furuno , Osamu Nakamura , Keitaro Imai
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2003-368166 20031028
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L33/08 ; G02F1/1368 ; H01L21/768 ; H01L27/12 ; H01L29/66 ; G02F1/1362

Abstract:
At least one or more of a conductive layer which forms a wiring or an electrode and a pattern necessary for manufacturing a display panel such as a mask for forming a predetermined pattern is formed by a method capable of selectively forming a pattern to manufacture a liquid crystal display device. A droplet discharge method capable of forming a predetermined pattern by selectively discharging a droplet of a composition in accordance with a particular object is used as a method capable of selectively forming a pattern in forming a conductive layer, an insulating layer, or the like.
Public/Granted literature
Information query
IPC分类: