Invention Grant
- Patent Title: Memory constructions
- Patent Title (中): 内存结构
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Application No.: US14503081Application Date: 2014-09-30
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Publication No.: US08987698B2Publication Date: 2015-03-24
- Inventor: Andrea Redaelli , Agostino Pirovano
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L45/00

Abstract:
Some embodiments include memory constructions having a plurality of bands between top and bottom electrically conductive materials. The bands include chalcogenide bands alternating with non-chalcogenide bands. In some embodiments, there may be least two of the chalcogenide bands and at least one of the non-chalcogenide bands. In some embodiments, the memory cells may be between a pair of electrodes; with one of the electrodes being configured as a lance, angled plate, container or beam. In some embodiments, the memory cells may be electrically coupled with select devices, such as, for example, diodes, field effect transistors or bipolar junction transistors.
Public/Granted literature
- US20150014623A1 Memory Constructions Public/Granted day:2015-01-15
Information query
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