Invention Grant
US08987734B2 Semiconductor wafer, semiconductor process and semiconductor package
有权
半导体晶圆,半导体工艺和半导体封装
- Patent Title: Semiconductor wafer, semiconductor process and semiconductor package
- Patent Title (中): 半导体晶圆,半导体工艺和半导体封装
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Application No.: US13843304Application Date: 2013-03-15
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Publication No.: US08987734B2Publication Date: 2015-03-24
- Inventor: Yung-Hui Wang
- Applicant: Advanced Semiconductor Engineering, Inc.
- Applicant Address: TW
- Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee: Advanced Semiconductor Engineering, Inc.
- Current Assignee Address: TW
- Agency: Morgan Law Offices, PLC
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L21/66 ; H01L27/04 ; H01L23/00

Abstract:
The present invention provides a semiconductor wafer, semiconductor package and semiconductor process. The semiconductor wafer includes a substrate, at least one metal segment and a plurality of dielectric layers. The semiconductor wafer is defined as a plurality of die areas and a plurality of trench areas, each of the die areas has an integrated circuit including a plurality of patterned metal layers disposed between the dielectric layers. The trench areas are disposed between the die areas, and the at least one metal segment is disposed in the trench area and insulated from the integrated circuit of the die area.
Public/Granted literature
- US20140264716A1 SEMICONDUCTOR WAFER, SEMICONDUCTOR PROCESS AND SEMICONDUCTOR PACKAGE Public/Granted day:2014-09-18
Information query
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