Invention Grant
US08988848B2 Extended and independent RF powered cathode substrate for extreme edge tunability
有权
扩展和独立的RF供电阴极基板，用于极端边缘可调性
- Patent Title: Extended and independent RF powered cathode substrate for extreme edge tunability
- Patent Title (中): 扩展和独立的RF供电阴极基板，用于极端边缘可调性
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Application No.: US13651351Application Date: 2012-10-12
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Publication No.: US08988848B2Publication Date: 2015-03-24
- Inventor: Valentin Todorow , Samer Banna , Imad Yousif , Albert Wang , Gary Leray
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: H01L21/683
- IPC: H01L21/683 ; H02N13/00 ; H01J37/32
Abstract:
Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a substrate support comprising a first electrode disposed within the substrate support and having a peripheral edge and a first surface; a substrate support surface disposed above the first surface of the first electrode; and a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode.
Public/Granted literature
- US20130155568A1 EXTENDED AND INDEPENDENT RF POWERED CATHODE SUBSTRATE FOR EXTREME EDGE TUNABILITY Public/Granted day:2013-06-20
Information query
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