发明授权
US08988848B2 Extended and independent RF powered cathode substrate for extreme edge tunability
有权
扩展和独立的RF供电阴极基板，用于极端边缘可调性
- 专利标题： Extended and independent RF powered cathode substrate for extreme edge tunability
- 专利标题（中）： 扩展和独立的RF供电阴极基板，用于极端边缘可调性
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申请号： US13651351申请日： 2012-10-12
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公开(公告)号： US08988848B2公开(公告)日： 2015-03-24
- 发明人: Valentin Todorow , Samer Banna , Imad Yousif , Albert Wang , Gary Leray
- 申请人： Applied Materials, Inc.
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Moser Taboada
- 代理商 Alan Taboada
- 主分类号： H01L21/683
- IPC分类号： H01L21/683 ; H02N13/00 ; H01J37/32
摘要：
Apparatus for processing substrates are provided herein. In some embodiments, an apparatus for processing a substrate may include a substrate support comprising a first electrode disposed within the substrate support and having a peripheral edge and a first surface; a substrate support surface disposed above the first surface of the first electrode; and a second electrode disposed within the substrate support and extending radially beyond the peripheral edge of the first electrode, wherein the second electrode has a second surface disposed about and above the first surface of the first electrode.