Invention Grant
US08993224B2 Multiple patterning process for forming trenches or holes using stitched assist features
有权
用于使用缝合辅助特征形成沟槽或孔的多重构图工艺
- Patent Title: Multiple patterning process for forming trenches or holes using stitched assist features
- Patent Title (中): 用于使用缝合辅助特征形成沟槽或孔的多重构图工艺
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Application No.: US14286285Application Date: 2014-05-23
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Publication No.: US08993224B2Publication Date: 2015-03-31
- Inventor: Yuyang Sun , Norman S. Chen , Jian Liu
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/20 ; G03F1/68 ; G03F1/76
Abstract:
One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first sub-target pattern and a second sub-target pattern, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, generating a first set of mask data information corresponding to the first sub-target pattern, and generating a second set of mask data information corresponding to the second sub-target pattern.
Public/Granted literature
- US20140253902A1 MULTIPLE PATTERNING PROCESS FOR FORMING TRENCHES OR HOLES USING STITCHED ASSIST FEATURES Public/Granted day:2014-09-11
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