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1.发明申请MULTIPLE PATTERNING PROCESS FOR FORMING TRENCHES OR HOLES USING STITCHED ASSIST FEATURES 有权使用刺绣辅助功能形成倾斜或多孔的多种花样公开(公告)号：US20140253902A1
公开(公告)日：2014-09-11
申请号：US14286285
申请日：2014-05-23
Applicant: GLOBALFOUNDRIES Inc.
Inventor： Yuyang Sun , Norman S. Chen , Jian Liu
IPC: G03F7/20
Abstract: One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first sub-target pattern and a second sub-target pattern, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, generating a first set of mask data information corresponding to the first sub-target pattern, and generating a second set of mask data information corresponding to the second sub-target pattern.
Abstract translation: 本文公开的一种说明性方法涉及识别由至少一个孔型特征组成的总体目标图案，将总体目标图案分解为至少第一子目标图案和第二子目标图案，其中第一子目标图案 并且所述第二子目标图案各自包括至少一个公共孔型特征，产生与所述第一子目标图案相对应的第一组掩模数据信息，以及生成与所述第二子目标图形对应的第二组掩模数据信息， 目标模式。
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公开(公告)号：US09026977B2
公开(公告)日：2015-05-05
申请号：US13968850
申请日：2013-08-16
Applicant: GLOBALFOUNDRIES Inc.
Inventor： Marc Tarabbia , Norman Chen , Jian Liu , Nader Magdy Hindawy , Tuhin Guha Neogi , Mahbub Rashed , Anurag Mittal
CPC classification number: G06F17/5077 , G06F2217/06 , G06F2217/78
Abstract: A method includes electrically connecting a plurality of cells of a standard cell library to a power rail. A contact area is deposited to connect a first active area and a second active area of a cell of a plurality cells. The first area and the second area are located on opposite sides of the rail and electrically connected to different drains. The contact area is electrically connected to the power rail using a via. The contact area is masked to remove a portion of the contact area to electrically separate the first active are from the second active area.
Abstract translation: 一种方法包括将标准单元库的多个单元电连接到电源轨。 沉积接触区以连接多个单元的单元的第一有源区和第二有源区。 第一区域和第二区域位于轨道的相对侧并且电连接到不同的排水沟。 接触区域使用通孔电连接到电源轨。 接触区域被屏蔽以去除接触区域的一部分以将第一活性物质与第二活性区域电分离。
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3.发明授权Multiple patterning process for forming trenches or holes using stitched assist features 有权用于使用缝合辅助特征形成沟槽或孔的多重构图工艺公开(公告)号：US08993224B2
公开(公告)日：2015-03-31
申请号：US14286285
申请日：2014-05-23
Applicant: GLOBALFOUNDRIES Inc.
Inventor： Yuyang Sun , Norman S. Chen , Jian Liu
Abstract: One illustrative method disclosed herein involves identifying an overall target pattern comprised of at least one hole-type feature, decomposing the overall target pattern into at least a first sub-target pattern and a second sub-target pattern, wherein the first sub-target pattern and the second sub-target pattern each comprise at least one common hole-type feature, generating a first set of mask data information corresponding to the first sub-target pattern, and generating a second set of mask data information corresponding to the second sub-target pattern.
Abstract translation: 本文公开的一种说明性方法涉及识别由至少一个孔型特征组成的总体目标图案，将总体目标图案分解为至少第一子目标图案和第二子目标图案，其中第一子目标图案 并且所述第二子目标图案各自包括至少一个公共孔型特征，产生与所述第一子目标图案相对应的第一组掩模数据信息，以及生成与所述第二子目标图形对应的第二组掩模数据信息， 目标模式。
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