Stacked carbon-based FETs

Invention Grant

US08994080B2 Stacked carbon-based FETs 有权

Title translation: 堆叠碳基FET

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Patent Title: Stacked carbon-based FETs
Patent Title (中): 堆叠碳基FET
Application No.: US13968101

Application Date: 2013-08-15
Publication No.: US08994080B2

Publication Date: 2015-03-31
Inventor: Dechao Guo , Shu-Jen Han , Yu Lu , Keith Kwong Hon Wong
Applicant: International Business Machines Corporation
Applicant Address: US NY Armonk
Assignee: International Business Machines Corporation
Current Assignee: International Business Machines Corporation
Current Assignee Address: US NY Armonk
Agency: Tutunjian & Bitetto, P.C.
Agent Vazken Alexanian
Main IPC: H01L21/8238
IPC: H01L21/8238 ; H01L29/16 ; H01L21/8234 ; H01L29/78

Abstract:

Stacked transistor devices include a lower channel layer formed on a substrate; a pair of vertically aligned source regions formed over the lower channel layer, where the pair of source regions are separated by an insulator; a pair of vertically aligned drain regions formed on the lower channel layer, where the pair of drain regions are separated by an insulator; a pair of vertically aligned gate regions formed on the lower gate dielectric layer; and an upper channel layer formed over the source regions, drain regions, and gate regions.

Abstract(Chinese):

堆叠晶体管器件包括形成在衬底上的下沟道层; 一对垂直对齐的源极区，形成在所述下部沟道层上，其中所述一对源极区被绝缘体隔开; 形成在下通道层上的一对垂直排列的漏极区，其中一对漏区由绝缘体分隔开; 形成在下栅极电介质层上的一对垂直排列的栅极区; 以及形成在源极区域，漏极区域和栅极区域上的上部沟道层。

Public/Granted literature

US20140332862A1 STACKED CARBON-BASED FETS Public/Granted day:2014-11-13

Information query

Espacenet

IPC分类:

H	电学
H01	基本电气元件
H01L	半导体器件；其他类目中不包括的电固体器件（使用半导体器件的测量入G01；一般电阻器入H01C；磁体、电感器、变压器入H01F；一般电容器入H01G；电解型器件入H01G9/00；电池组、蓄电池入H01M；波导管、谐振器或波导型线路入H01P；线路连接器、汇流器入H01R；受激发射器件入H01S；机电谐振器入H03H；扬声器、送话器、留声机拾音器或类似的声机电传感器入H04R；一般电光源入H05B；印刷电路、混合电路、电设备的外壳或结构零部件、电气元件的组件的制造入H05K；在具有特殊应用的电路中使用的半导体器件见应用相关的小类）
H01L21/00	专门适用于制造或处理半导体或固体器件或其部件的方法或设备
H01L21/70	.由在一共用基片内或其上形成的多个固态组件或集成电路组成的器件或其部件的制造或处理；集成电路器件或其特殊部件的制造（由预制电组件组成的组装件的制造入H05K3/00，H05K13/00）
H01L21/77	..在公共衬底中或上面形成的由许多固态元件或集成电路组成的器件的制造或处理（电可编程只读存储器或其多步骤的制造方法入H01L27/115）
H01L21/78	...把衬底连续地分成多个独立的器件（改变表面物理特性或者半导体形状的切割入H01L21/304）
H01L21/82	....制造器件，例如每一个由许多元件组成的集成电路
H01L21/822	.....衬底是采用硅工艺的半导体的（H01L21/8258优先）
H01L21/8232	......场效应工艺
H01L21/8234	.......MIS工艺
H01L21/8238	........互补场效应晶体管，例如CMOS