Invention Grant
- Patent Title: Double-sided maskless exposure system and method
- Patent Title (中): 双面无掩模曝光系统及方法
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Application No.: US13523924Application Date: 2012-06-15
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Publication No.: US08994916B2Publication Date: 2015-03-31
- Inventor: Wenhui Mei , Weichong Du , Lujie Qu
- Applicant: Wenhui Mei , Weichong Du , Lujie Qu
- Priority: CN201210159451 20120521
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00

Abstract:
A double-sided maskless exposure system and method consists of light sources which includes two light wavelength segments, maskless optical engines in which a 2D spatial light modulation (spatial light modulator) device, such as DMD, is generating a plurality of pixel array of the pattern, vision system, moving substrate and computer control system. The double-sided maskless exposure system at least includes two maskless optical engines with auto-calibration function which can correct any alignment error in-line. Each optical engine is for each side of the substrate. The optical engines are aligned each other in pairs and are simultaneously patterning on each side of the moving substrate. The system also includes a manipulator for moving, stepping or scanning the optical engines, relative to the substrate so that it can create a contiguous whole image on the both sides of the subject.
Public/Granted literature
- US20130044300A1 Double-Sided Maskless Exposure System and Method Public/Granted day:2013-02-21
Information query
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