Invention Grant
- Patent Title: Nonvolatile memory device having a current limiting element
- Patent Title (中): 具有限流元件的非易失性存储器件
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Application No.: US14186726Application Date: 2014-02-21
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Publication No.: US08995172B2Publication Date: 2015-03-31
- Inventor: Yun Wang , Tony P. Chiang , Imran Hashim
- Applicant: Intermolecular Inc. , Kabushiki Kaisha Toshiba , SanDisk 3D LLC
- Applicant Address: US CA San Jose JP Tokyo US CA Milpitas
- Assignee: Intermolecular, Inc.,Kabushiki Kaisha Toshiba,SanDisk 3D LLC
- Current Assignee: Intermolecular, Inc.,Kabushiki Kaisha Toshiba,SanDisk 3D LLC
- Current Assignee Address: US CA San Jose JP Tokyo US CA Milpitas
- Main IPC: G11C11/00
- IPC: G11C11/00 ; H01L29/02 ; H01L45/00 ; G11C13/00 ; H01L27/24

Abstract:
Embodiments of the invention generally include a method of forming a nonvolatile memory device that contains a resistive switching memory element that has an improved device switching performance and lifetime, due to the addition of a current limiting component disposed therein. In one embodiment, the current limiting component comprises at least one layer of resistive material that is configured to improve the switching performance and lifetime of the formed resistive switching memory element. The electrical properties of the formed current limiting layer, or resistive layer, are configured to lower the current flow through the variable resistance layer during the logic state programming steps (i.e., “set” and “reset” steps) by adding a fixed series resistance in the formed resistive switching memory element found in the nonvolatile memory device. Typically, resistive switching memory elements may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices, such as digital cameras, mobile telephones, handheld computers, and music players.
Public/Granted literature
- US20140183436A1 Nonvolatile Memory Device Having a Current Limiting Element Public/Granted day:2014-07-03
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