Invention Grant
- Patent Title: Edge-emitting semiconductor laser
- Patent Title (中): 边缘发射半导体激光器
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Application No.: US14118819Application Date: 2012-06-08
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Publication No.: US08995491B2Publication Date: 2015-03-31
- Inventor: Hans Lindberg
- Applicant: Hans Lindberg
- Applicant Address: DE Regensburg
- Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee: OSRAM Opto Semiconductors GmbH
- Current Assignee Address: DE Regensburg
- Agency: Slater & Matsil, L.L.P.
- Priority: DE102011103952 20110610
- International Application: PCT/EP2012/060910 WO 20120608
- International Announcement: WO2012/168437 WO 20121213
- Main IPC: H01S5/00
- IPC: H01S5/00 ; H01S5/10 ; H01S5/042 ; H01S5/40 ; H01S5/12 ; H01S5/026 ; H01S5/065

Abstract:
An edge-emitting semiconductor laser includes a first waveguide layer, into which an active layer that generates laser radiation is embedded. The laser also includes a second waveguide layer, into which no active layer is embedded. The laser radiation generated in the active layer forms a standing wave, which has respective intensity maxima in the first waveguide layer and corresponding intensity minima in the second waveguide layer and respective intensity minima in the first waveguide layer and corresponding intensity maxima in the second waveguide layer at periodic intervals in a beam direction of the semiconductor laser. An at least regionally periodic contact structure is arranged at a surface of the edge-emitting semiconductor laser. A period length of the contact structure is equal to a period length of the standing wave, such that the semiconductor laser has an emission wavelength that is set by the period length of the contact structure.
Public/Granted literature
- US20140133505A1 Edge-Emitting Semiconductor Laser Public/Granted day:2014-05-15
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