Invention Grant
US08998388B2 Method for manufacturing a fluid ejection device and fluid ejection device
有权
用于制造流体喷射装置和流体喷射装置的方法
- Patent Title: Method for manufacturing a fluid ejection device and fluid ejection device
- Patent Title (中): 用于制造流体喷射装置和流体喷射装置的方法
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Application No.: US14253276Application Date: 2014-04-15
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Publication No.: US08998388B2Publication Date: 2015-04-07
- Inventor: Mauro Cattaneo , Roberto Campedelli , Igor Varisco
- Applicant: STMicroelectronics S.r.l.
- Applicant Address: IT Agrate Brianza
- Assignee: STMicroelectronics S.r.l.
- Current Assignee: STMicroelectronics S.r.l.
- Current Assignee Address: IT Agrate Brianza
- Agency: Seed IP Law Group PLLC
- Priority: ITTO2013A0312 20130418
- Main IPC: B41J2/045
- IPC: B41J2/045 ; B41J2/14 ; B41J2/16

Abstract:
A method for manufacturing a fluid ejection device, comprising the steps of: providing a first semiconductor body having a membrane layer and a piezoelectric actuator which extends over the membrane layer; forming a cavity underneath the membrane layer to form a suspended membrane; providing a second semiconductor body; making, in the second semiconductor body, an inlet through hole configured to form a supply channel of the fluid ejection device; providing a third semiconductor body; forming a recess in the third semiconductor body; forming an outlet channel through the third semiconductor body to form an ejection nozzle of the fluid ejection device; coupling the first semiconductor body with the third semiconductor body and the first semiconductor body with the second semiconductor body in such a way that the piezoelectric actuator is completely housed in the first recess, and the second recess forms an internal chamber of the fluid ejection device.
Public/Granted literature
- US20140313264A1 METHOD FOR MANUFACTURING A FLUID EJECTION DEVICE AND FLUID EJECTION DEVICE Public/Granted day:2014-10-23
Information query
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