发明授权
- 专利标题: Middle-of-the-line constructs using diffusion contact structures
- 专利标题(中): 使用扩散接触结构的中间线构造
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申请号: US13568737申请日: 2012-08-07
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公开(公告)号: US09006100B2公开(公告)日: 2015-04-14
- 发明人: Mahbub Rashed , Yuansheng Ma , Irene Lin , Jason Stephens , Yunfei Deng , Yuan Lei , Jongwook Kye , Rod Augur , Shibly Ahmed , Subramani Kengeri , Suresh Venkatesan
- 申请人: Mahbub Rashed , Yuansheng Ma , Irene Lin , Jason Stephens , Yunfei Deng , Yuan Lei , Jongwook Kye , Rod Augur , Shibly Ahmed , Subramani Kengeri , Suresh Venkatesan
- 申请人地址: KY Grand Cayman
- 专利权人: GLOBALFOUNDRIES Inc.
- 当前专利权人: GLOBALFOUNDRIES Inc.
- 当前专利权人地址: KY Grand Cayman
- 代理机构: Ditthavong & Steiner, P.C.
- 主分类号: H01L21/4763
- IPC分类号: H01L21/4763 ; H01L27/02 ; H01L21/8238 ; H01L21/768
摘要:
An approach for providing MOL constructs using diffusion contact structures is disclosed. Embodiments include: providing a first diffusion region in a substrate; providing, via a first lithography process, a first diffusion contact structure; providing, via a second lithography process, a second diffusion contact structure; and coupling the first diffusion contact structure to the first diffusion region and the second diffusion contact structure. Embodiments include: providing a second diffusion region in the substrate; providing a diffusion gap region between the first and second diffusion regions; providing the diffusion contact structure over the diffusion gap region; and coupling, via the diffusion contact structure, the first and second diffusion regions.