发明授权
- 专利标题: Positive photosensitive material
- 专利标题(中): 正感光材料
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申请号: US13524790申请日: 2012-06-15
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公开(公告)号: US09012126B2公开(公告)日: 2015-04-21
- 发明人: Weihong Liu , PingHung Lu , Chunwei Chen , Stephen Meyer , Medhat Toukhy , SookMee Lai
- 申请人: Weihong Liu , PingHung Lu , Chunwei Chen , Stephen Meyer , Medhat Toukhy , SookMee Lai
- 申请人地址: LU Luxembourg
- 专利权人: AZ Electronic Materials (Luxembourg) S.A.R.L.
- 当前专利权人: AZ Electronic Materials (Luxembourg) S.A.R.L.
- 当前专利权人地址: LU Luxembourg
- 代理商 Sangya Jain
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; G03F7/004
摘要:
The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
公开/授权文献
- US20130337380A1 POSITIVE PHOTOSENSITIVE MATERIAL 公开/授权日:2013-12-19
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