发明授权
US09017925B2 Photoresist resin composition and method of forming patterns by using the same
有权
光刻胶树脂组合物及使用其形成图案的方法
- 专利标题： Photoresist resin composition and method of forming patterns by using the same
- 专利标题（中）： 光刻胶树脂组合物及使用其形成图案的方法
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申请号： US13224935申请日： 2011-09-02
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公开(公告)号： US09017925B2公开(公告)日： 2015-04-28
- 发明人: Jeong Won Kim , Jin Ho Ju , Jong Kwang Lee , Min Kang , Tae Gyun Kim
- 申请人： Jeong Won Kim , Jin Ho Ju , Jong Kwang Lee , Min Kang , Tae Gyun Kim
- 申请人地址： KR
- 专利权人： Samsung Display Co., Ltd.
- 当前专利权人： Samsung Display Co., Ltd.
- 当前专利权人地址： KR
- 代理机构： Innovation Counsel LLP
- 优先权： KR10-2011-0025286 20110322
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/023 ; G03F7/022
摘要：
A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.