Invention Grant
US09028022B2 Liquid ejection apparatus, nanoimprint system, and liquid ejection method
有权
液体喷射装置,纳米压印系统和液体喷射方法
- Patent Title: Liquid ejection apparatus, nanoimprint system, and liquid ejection method
- Patent Title (中): 液体喷射装置,纳米压印系统和液体喷射方法
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Application No.: US14471699Application Date: 2014-08-28
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Publication No.: US09028022B2Publication Date: 2015-05-12
- Inventor: Kenichi Kodama , Satoshi Wakamatsu
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2012-043570 20120229
- Main IPC: B41J11/00
- IPC: B41J11/00 ; B41J2/045 ; B41J13/00

Abstract:
According an aspect of the present invention, when causing the liquid ejection head to perform a feeding operation along a first direction, the substrate is retracted outside the projected feeding region of the liquid ejection head and the supporting member thereof prior to starting the feeding operation of the liquid ejection head, preventing dusts and other foreign matters, generated as a result of the feeding operation of the liquid ejection head and the supporting member, from being deposited on a surface of the substrate onto which the liquid is to be deposited.
Public/Granted literature
- US20140368568A1 LIQUID EJECTION APPARATUS, NANOIMPRINT SYSTEM, AND LIQUID EJECTION METHOD Public/Granted day:2014-12-18
Information query
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