Invention Grant
US09029785B2 Method of fabricating microlens, and depth sensor including microlens
有权
微透镜的制造方法,以及微透镜的深度传感器
- Patent Title: Method of fabricating microlens, and depth sensor including microlens
- Patent Title (中): 微透镜的制造方法,以及微透镜的深度传感器
-
Application No.: US13407879Application Date: 2012-02-29
-
Publication No.: US09029785B2Publication Date: 2015-05-12
- Inventor: Doo Cheol Park , Seung Hyuk Chang , Myung-Sun Kim , Won Joo Kim , Ju Hwan Jung , Seung Hoon Lee , Kwang-Min Lee , Hyoung Soo Ko
- Applicant: Doo Cheol Park , Seung Hyuk Chang , Myung-Sun Kim , Won Joo Kim , Ju Hwan Jung , Seung Hoon Lee , Kwang-Min Lee , Hyoung Soo Ko
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Volentine & Whitt, PLLC
- Priority: KR10-2011-0019001 20110303
- Main IPC: G02B13/00
- IPC: G02B13/00 ; G02B3/00 ; G02B13/14 ; G03F7/40 ; G02B23/14

Abstract:
A method of fabricating a microlens includes forming layer of photoresist on a substrate, patterning the layer of photoresist, and then reflowing the photoresist pattern. The layer of photoresist is formed by coating the substrate with liquid photoresist whose viscosity is 150 to 250 cp. A depth sensor includes a substrate and photoelectric conversion elements at an upper portion of the substrate, a metal wiring section disposed on the substrate, an array of the microlenses for focusing incident light as beams onto the photoelectric conversion elements and which beams avoid the wirings of the metal wiring section. The depths sensor also includes a layer presenting a flat upper surface on which the microlenses are formed. The layer may be a dedicated planarization layer or an IR filter, interposed between the microlenses and the metal wiring section.
Public/Granted literature
- US20120224028A1 METHOD OF FABRICATING MICROLENS, AND DEPTH SENSOR INCLUDING MICROLENS Public/Granted day:2012-09-06
Information query