发明授权
- 专利标题: Filter for material supply apparatus of an extreme ultraviolet light source
- 专利标题(中): 过滤器用于极紫外光源的材料供应装置
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申请号: US13112784申请日: 2011-05-20
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公开(公告)号: US09029813B2公开(公告)日: 2015-05-12
- 发明人: Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
- 申请人: Igor V. Fomenkov , William N. Partlo , Georgiy O. Vaschenko , William Oldham
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: DiBerardino McGovern IP Group LLC
- 主分类号: G01J3/10
- IPC分类号: G01J3/10 ; B22F3/105 ; B01D29/56
摘要:
A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
公开/授权文献
- US20120292527A1 Filter for Material Supply Apparatus 公开/授权日:2012-11-22
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