发明授权
US09029813B2 Filter for material supply apparatus of an extreme ultraviolet light source 有权
过滤器用于极紫外光源的材料供应装置

Filter for material supply apparatus of an extreme ultraviolet light source
摘要:
A filter is used in a target material supply apparatus and includes a sheet having a first flat surface and a second opposing flat surface, and a plurality of through holes. The first flat surface is in fluid communication with a reservoir that holds a target mixture that includes a target material and non-target particles. The through holes extend from the second flat surface and are fluidly coupled at the second flat surface to an orifice of a nozzle. The sheet has a surface area that is exposed to the target mixture, the exposed surface area being at least a factor of one hundred less than an exposed surface area of a sintered filter having an equivalent transverse extent to that of the sheet.
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