Invention Grant
US09034558B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
有权
光化学射线或辐射敏感性树脂组合物，光化射线或辐射敏感膜以及形成图案的方法
- Patent Title: Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern
- Patent Title (中): 光化学射线或辐射敏感性树脂组合物，光化射线或辐射敏感膜以及形成图案的方法
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Application No.: US13808489Application Date: 2011-09-28
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Publication No.: US09034558B2Publication Date: 2015-05-19
- Inventor: Shuhei Yamaguchi , Akinori Shibuya , Yusuke Iizuka
- Applicant: Shuhei Yamaguchi , Akinori Shibuya , Yusuke Iizuka
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-219515 20100929
- International Application: PCT/JP2011/072905 WO 20110928
- International Announcement: WO2012/043866 WO 20120405
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/039 ; G03F7/20 ; C08F12/20 ; C08F12/22 ; C08F12/26 ; C08F12/30 ; C08F212/12 ; G03F7/11 ; C08F212/14 ; C08F220/42 ; C08F220/28
Abstract:
Provided is an actinic-ray- or radiation-sensitive resin composition including (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin, wherein the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below.
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