Invention Grant
US09035306B2 Adjusting configuration of a multiple gate transistor by controlling individual fins
有权
通过控制单个散热片来调整多栅极晶体管的配置
- Patent Title: Adjusting configuration of a multiple gate transistor by controlling individual fins
- Patent Title (中): 通过控制单个散热片来调整多栅极晶体管的配置
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Application No.: US13869162Application Date: 2013-04-24
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Publication No.: US09035306B2Publication Date: 2015-05-19
- Inventor: Jan Hoentschel , Robert Mulfinger , Vassilios Papageorgiou
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Amerson Law Firm, PLLC
- Priority: DE102008063429 20081231
- Main IPC: H01L23/58
- IPC: H01L23/58 ; H01L21/84 ; H01L27/12 ; H01L29/66 ; H01L29/78

Abstract:
In a sophisticated semiconductor device, FINFET elements may be provided with individually accessible semiconductor fins which may be connected to a controllable interconnect structure for appropriately adjusting the transistor configuration, for instance with respect to current drive capability, replacing defective semiconductor fins and the like. Consequently, different transistor configurations may be obtained on the basis of a standard transistor cell architecture, which may result in increased production yield of highly complex manufacturing strategies in forming non-planar transistor devices.
Public/Granted literature
- US20130306967A1 ADJUSTING CONFIGURATION OF A MULTIPLE GATE TRANSISTOR BY CONTROLLING INDIVIDUAL FINS Public/Granted day:2013-11-21
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