Invention Grant
- Patent Title: Silicon substrate optimization for microarray technology
- Patent Title (中): 微阵列技术的硅衬底优化
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Application No.: US13272063Application Date: 2011-10-12
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Publication No.: US09039996B2Publication Date: 2015-05-26
- Inventor: Massimiliano Pesaturo , Robert J. Powell
- Applicant: Massimiliano Pesaturo , Robert J. Powell
- Applicant Address: US TX Coppell
- Assignee: STMicroelectronics, Inc.
- Current Assignee: STMicroelectronics, Inc.
- Current Assignee Address: US TX Coppell
- Agency: Seed IP Law Group PLLC
- Main IPC: B01L3/00
- IPC: B01L3/00 ; C40B60/10

Abstract:
A micro device includes a substrate and a structure configured to bind to an object or a material, or not to bind to an object or material. The structure has a roughness based on a roughness of the object or material. For example, a microarray includes a substrate and a well positioned in the substrate and configured to bind to a type of bead. The well has a roughness based on a roughness of the type of bead to which the well is configured to bind. The roughness of the well is controlled by controlling a position and number of striations in the side of the well. In another example, a moveable component of a micro device may have a roughness different from a roughness of an adjacent component, to reduce the likelihood of the moveable component sticking to the adjacent component.
Public/Granted literature
- US20120093700A1 SILICON SUBSTRATE OPTIMIZATION FOR MICROARRAY TECHNOLOGY Public/Granted day:2012-04-19
Information query
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