Invention Grant
- Patent Title: Defect inspection device and defect inspection method
- Patent Title (中): 缺陷检查装置和缺陷检查方法
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Application No.: US13519138Application Date: 2011-01-17
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Publication No.: US09041921B2Publication Date: 2015-05-26
- Inventor: Toshiyuki Nakao , Shigenobu Maruyama , Yuta Urano , Toshifumi Honda
- Applicant: Toshiyuki Nakao , Shigenobu Maruyama , Yuta Urano , Toshifumi Honda
- Applicant Address: JP Tokyo
- Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Baker Botts L.L.P.
- Priority: JP2010-017620 20100129
- International Application: PCT/JP2011/000187 WO 20110117
- International Announcement: WO2011/093022 WO 20110804
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01N21/95 ; G01N21/47

Abstract:
A defect inspection device has: an illumination optical system which irradiates a predetermined region of an inspection target with illumination light; a detection optical system which has a detector provided with a plurality of pixels by which scattered light from the predetermined region of the inspection target due to illumination light from the illumination optical system can be detected; and a signal processing portion which is provided with a correction portion which corrects pixel displacement caused by change in a direction perpendicular to a surface of the inspection target with respect to a detection signal based on the scattered light detected by the detector of the detection optical system, and a defect determination portion which determines a defect on the surface of the inspection target based on the detection signal corrected by the correction portion.
Public/Granted literature
- US20130003052A1 DEFECT INSPECTION DEVICE AND DEFECT INSPECTION METHOD Public/Granted day:2013-01-03
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