Invention Grant
- Patent Title: Electrostatic discharge protection device
- Patent Title (中): 静电放电保护装置
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Application No.: US13666509Application Date: 2012-11-01
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Publication No.: US09048098B2Publication Date: 2015-06-02
- Inventor: Ke-Yuan Chen , Jyh-Fong Lin
- Applicant: VIA TECHNOLOGIES, INC.
- Applicant Address: TW New Taipei
- Assignee: VIA TECHNOLOGIES, INC.
- Current Assignee: VIA TECHNOLOGIES, INC.
- Current Assignee Address: TW New Taipei
- Agency: McClure, Qualey & Rodack, LLP
- Priority: TW100140851A 20111109
- Main IPC: H01L27/02
- IPC: H01L27/02

Abstract:
An electrostatic discharge protection device, having a P-type semiconductor substrate set as floating; a first N-well and a second N-well formed in the P-type substrate; a first P-doped region and a second P-doped region formed in the first N-well and the second N-well, respectively. The first N-well and the first P-doped region form a first diode, and the second N-well and the second P-doped region form a second diode. A first N-doped region and a second N-doped region formed in the first N-well and the second N-well respectively. A third P-doped region is formed in the P-type substrate, wherein the third P-doped region is disposed between the first N-well and the second N-well, and the third P-doped region is electrically connected to the first N-doped region and the second P-doped region.
Public/Granted literature
- US20130114173A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE Public/Granted day:2013-05-09
Information query
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