Invention Grant
- Patent Title: Charged particle beam writing apparatus and charged particle beam writing method
- Patent Title (中): 带电粒子束写入装置和带电粒子束写入方法
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Application No.: US13370835Application Date: 2012-02-10
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Publication No.: US09063440B2Publication Date: 2015-06-23
- Inventor: Yasuo Kato
- Applicant: Yasuo Kato
- Applicant Address: JP Numazu-shi
- Assignee: NuFlare Technology, Inc.
- Current Assignee: NuFlare Technology, Inc.
- Current Assignee Address: JP Numazu-shi
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2011-033303 20110218
- Main IPC: G21K5/00
- IPC: G21K5/00 ; G03F1/78 ; H01J37/302 ; H01J37/317 ; B82Y10/00 ; B82Y40/00

Abstract:
A charged particle beam writing apparatus includes a storage unit to store each pattern data of plural figure patterns arranged in each of plural small regions made by virtually dividing a writing region of a target workpiece to be written on which resist being coated. The charged particle beam writing apparatus further including an assignment unit to assign each pattern data of each figure pattern to be arranged in each of the plural small regions concerned, and a writing unit to write, for each of plural groups, each figure pattern in each of the plural small regions concerned by using a charged particle beam.
Public/Granted literature
- US20120211674A1 CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD Public/Granted day:2012-08-23
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