Invention Grant
- Patent Title: Gas sensor processing apparatus
- Patent Title (中): 气体传感器处理装置
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Application No.: US13739543Application Date: 2013-01-11
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Publication No.: US09068934B2Publication Date: 2015-06-30
- Inventor: Kentaro Mori , Soichi Kawaguchi , Ryosuke Ichida , Yoshinori Hibino
- Applicant: NGK SPARK PLUG CO., LTD.
- Applicant Address: JP Aichi
- Assignee: NGK SPARK PLUG CO., LTD.
- Current Assignee: NGK SPARK PLUG CO., LTD.
- Current Assignee Address: JP Aichi
- Agency: Sughrue Mion, PLLC
- Priority: JP2012-004568 20120113
- Main IPC: G01N27/409
- IPC: G01N27/409 ; F02D41/14 ; G01N27/406

Abstract:
A gas sensor processing apparatus (1) which includes voltage shift means (11, 19, S1071) for shifting a detection element voltage VE produced between electrodes (3P, 3N) of a detection element (3) from a pre-shift voltage VE1 to a post-shift voltage VE2; recovery means (11, 19, S1072) for returning the detection element voltage VE from the post-shift voltage VE2 to the pre-shift voltage VE1 after the end of a voltage shift period TS in which the voltage VE is shifted by the voltage shift means; and deterioration index detection means S106-S107 for detecting a deterioration index ID representing the degree of deterioration of the detection element (3) on the basis of a voltage change in the recovery period TK in which the voltage VE is recovered by the recovery means.
Public/Granted literature
- US20130180853A1 GAS SENSOR PROCESSING APPARATUS Public/Granted day:2013-07-18
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