Invention Grant
- Patent Title: Semiconductor device and method of manufacturing same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US14464026Application Date: 2014-08-20
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Publication No.: US09076700B2Publication Date: 2015-07-07
- Inventor: Michihiro Kawashita , Yasuhiro Yoshimura , Naotaka Tanaka , Takahiro Naito , Takashi Akazawa
- Applicant: Tessera Advanced Technologies, Inc.
- Applicant Address: US CA San Jose
- Assignee: Tessera Advanced Technologies, Inc.
- Current Assignee: Tessera Advanced Technologies, Inc.
- Current Assignee Address: US CA San Jose
- Agency: Haynes and Boone, LLP
- Priority: JP2008-323581 20081219
- Main IPC: H01L23/48
- IPC: H01L23/48 ; H01L23/00 ; H01L21/683 ; H01L21/768 ; H01L25/065 ; H01L25/00 ; H01L23/538

Abstract:
In a semiconductor device in which a plurality of semiconductor chips are stacked, performance is enhanced without deteriorating productivity. The semiconductor device has a plurality of elements, an interlayer insulating film, a pad, and a bump electrode electrically connected with the pad sequentially formed on a main surface of a silicon substrate and has a back-surface electrode formed on a back surface of the silicon substrate and electrically connected with the bump electrode. The bump electrode has a protruding portion penetrating through the pad and protruding toward the silicon substrate side. The back-surface electrode is formed so as to reach the protruding portion of the bump electrode from the back surface side of the silicon substrate toward the main surface side and to cover the inside of a back-surface electrode hole portion which does not reach the pad, so that the back-surface electrode is electrically connected with the bump electrode.
Public/Granted literature
- US20150001711A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME Public/Granted day:2015-01-01
Information query
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