Invention Grant
US09076816B2 Method and device for self-aligned contact on a non-recessed metal gate
有权
在非凹槽金属门上进行自对准接触的方法和装置
- Patent Title: Method and device for self-aligned contact on a non-recessed metal gate
- Patent Title (中): 在非凹槽金属门上进行自对准接触的方法和装置
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Application No.: US14080842Application Date: 2013-11-15
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Publication No.: US09076816B2Publication Date: 2015-07-07
- Inventor: Xunyuan Zhang , Xiuyu Cai , Hoon Kim
- Applicant: GLOBALFOUNDRIES Inc.
- Applicant Address: KY Grand Cayman
- Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee: GLOBALFOUNDRIES Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: Ditthavong & Steiner, P.C.
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/49

Abstract:
A methodology for forming a self-aligned contact (SAC) that exhibits reduced likelihood of a contact-to-gate short circuit failure and the resulting device are disclosed. Embodiments may include forming a replacement metal gate, with spacers at opposite sides thereof, on a substrate, forming a recess in an upper surface of the spacers along outer edges of the replacement metal gate, and forming an aluminum nitride (AlN) cap over the metal gate and in the recess.
Public/Granted literature
- US20150137273A1 METHOD AND DEVICE FOR SELF-ALIGNED CONTACT ON A NON-RECESSED METAL GATE Public/Granted day:2015-05-21
Information query
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