Invention Grant
US09081291B2 Resist stripping solution composition, and method for stripping resist by using same
有权
抗剥离溶液组合物，以及通过使用它们剥离抗蚀剂的方法
- Patent Title: Resist stripping solution composition, and method for stripping resist by using same
- Patent Title (中): 抗剥离溶液组合物，以及通过使用它们剥离抗蚀剂的方法
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Application No.: US13387087Application Date: 2010-08-10
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Publication No.: US09081291B2Publication Date: 2015-07-14
- Inventor: Myun-Kyu Park , Tae-Hee Kim , Jeong-Hyun Kim , Seung-Yong Lee , Byoung-Mook Kim
- Applicant: Myun-Kyu Park , Tae-Hee Kim , Jeong-Hyun Kim , Seung-Yong Lee , Byoung-Mook Kim
- Applicant Address: KR
- Assignee: Dongwoo Fine-Chem Co., Ltd.
- Current Assignee: Dongwoo Fine-Chem Co., Ltd.
- Current Assignee Address: KR
- Agency: Schwegman Lundberg & Woessner, P.A.
- Priority: KR10-2009-0073762 20090811
- International Application: PCT/KR2010/005238 WO 20100810
- International Announcement: WO2011/019189 WO 20110217
- Main IPC: G03F7/42
- IPC: G03F7/42 ; C11D11/00
Abstract:
Disclosed is a resist stripping solution composition, which is highly capable of removing a resist pattern and an etching residue after dry etching or wet etching, manifests excellent anticorrosive effects on metal wiring including aluminum and/or copper because a predetermined polyol compound is used, and also can process a number of substrates because a predetermined amide compound is used, thus greatly contributing to reducing the cost. A method of stripping a resist using the resist stripping solution composition is also provided.
Public/Granted literature
- US20120181248A1 RESIST STRIPPING SOLUTION COMPOSITION, AND METHOD FOR STRIPPING RESIST BY USING SAME Public/Granted day:2012-07-19
Information query
IPC分类:
