发明授权
US09087719B2 Extended drain non-planar MOSFETs for electrostatic discharge (ESD) protection
有权
用于静电放电(ESD)保护的扩展漏极非平面MOSFET
- 专利标题: Extended drain non-planar MOSFETs for electrostatic discharge (ESD) protection
- 专利标题(中): 用于静电放电(ESD)保护的扩展漏极非平面MOSFET
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申请号: US13631586申请日: 2012-09-28
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公开(公告)号: US09087719B2公开(公告)日: 2015-07-21
- 发明人: Akm Ahsan , Walid M. Hafez
- 申请人: Akm Ahsan , Walid M. Hafez
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Blakely, Sokoloff, Taylor & Zafman LLP
- 主分类号: H02H9/00
- IPC分类号: H02H9/00 ; H01L27/088 ; H01L27/02 ; H02H9/04 ; H01L27/12 ; H02H1/04 ; H02H3/22
摘要:
Snapback ESD protection device employing one or more non-planar metal-oxide-semiconductor transistors (MOSFETs) are described. The ESD protection devices may further include lightly-doped extended drain regions, the resistances of which may be capacitively controlled through control gates independent of a gate electrode held at a ground potential. Control gates may be floated or biased to modulate ESD protection device performance. In embodiments, a plurality of core circuits are protected with a plurality of non-planar MOSFET-based ESD protection devices with control gate potentials varying across the plurality.
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