Invention Grant
- Patent Title: Precursors and methods for the selective deposition of cobalt and manganese on metal surfaces
- Patent Title (中): 在金属表面上选择性沉积钴和锰的前体和方法
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Application No.: US13780939Application Date: 2013-02-28
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Publication No.: US09090641B2Publication Date: 2015-07-28
- Inventor: Jeffrey W. Anthis
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Servilla Whitney LLC
- Main IPC: C07F15/06
- IPC: C07F15/06 ; C07F13/00 ; C23C16/04 ; C23C16/18 ; C23C16/455 ; C07D277/28
Abstract:
Provided are metal coordination complexes comprising a pyrrole or imidazole-based ligands and cobalt or manganese. Also provided are methods for the selective deposition of cobalt and/or manganese films on metal surfaces using these metal coordination complexes comprising a pyrrole or imidazole-based ligand.
Public/Granted literature
- US20130236657A1 Precursors And Methods For The Selective Deposition Of Cobalt And Manganese On Metal Surfaces Public/Granted day:2013-09-12
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