发明授权
- 专利标题: Optical element and lithographic apparatus
- 专利标题(中): 光学元件和光刻设备
-
申请号: US13372093申请日: 2012-02-13
-
公开(公告)号: US09097993B2公开(公告)日: 2015-08-04
- 发明人: Levinus Pieter Bakker
- 申请人: Levinus Pieter Bakker
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman LLP
- 优先权: EP03077850 20030910
- 主分类号: G02B5/18
- IPC分类号: G02B5/18 ; G03F7/20
摘要:
An optical element includes a surface including a tilted profile having height differences, thereby providing cavities and elevations having a predetermined maximum height difference, and a transmissive layer that covers the cavities and the elevations of the optical element. A first height of the transmissive layer in the cavities is substantially equal or larger than the predetermined maximum height difference and the transmissive layer has a second height on the elevations and the second height is about 10-500 nm. The transmissive layer is enabled to optically filter incident radiation, and the optical element is a grating.
公开/授权文献
- US20120140197A1 OPTICAL ELEMENT AND LITHOGRAPHIC APPARATUS 公开/授权日:2012-06-07
信息查询