发明授权
US09101956B2 Mask processing using films with spatially selective birefringence reduction
有权
使用具有空间选择性双折射降低的膜的掩模处理
- 专利标题: Mask processing using films with spatially selective birefringence reduction
- 专利标题(中): 使用具有空间选择性双折射降低的膜的掩模处理
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申请号: US13703549申请日: 2011-06-29
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公开(公告)号: US09101956B2公开(公告)日: 2015-08-11
- 发明人: William Ward Merrill , Douglas S. Dunn
- 申请人: William Ward Merrill , Douglas S. Dunn
- 申请人地址: US MN Saint Paul
- 专利权人: 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人: 3M INNOVATIVE PROPERTIES COMPANY
- 当前专利权人地址: US MN Saint Paul
- 代理商 Yufeng Dong; Gregory D. Allen
- 国际申请: PCT/US2011/042368 WO 20110629
- 国际公布: WO2012/012177 WO 20120126
- 主分类号: G02B5/32
- IPC分类号: G02B5/32 ; B05D5/06 ; G02B5/28 ; G02B5/30 ; G11B20/12 ; B42D25/391
摘要:
Certain patternable reflective films are used as masks to make other patterned articles, and one or more initial masks can be used to pattern the patternable reflective films. An exemplary patternable reflective film has an absorption characteristic suitable to, upon exposure to a radiant beam, absorptively heat a portion of the film by an amount sufficient to change a first reflective characteristic to a different second reflective characteristic. The change from the first to the second reflective characteristic is attributable to a change in birefringence of one or more layers or materials of the patternable film. In a related article, a mask is attached to such a patternable reflective film. The mask may have opaque portions and light-transmissive portions. Further, the mask may have light-transmissive portions with structures such as focusing elements and/or prismatic elements.