发明授权
US09102035B2 Method for machining seed rods for use in a chemical vapor deposition polysilicon reactor
有权
用于化学气相沉积多晶硅反应器的种子棒的加工方法
- 专利标题： Method for machining seed rods for use in a chemical vapor deposition polysilicon reactor
- 专利标题（中）： 用于化学气相沉积多晶硅反应器的种子棒的加工方法
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申请号： US13417792申请日： 2012-03-12
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公开(公告)号： US09102035B2公开(公告)日： 2015-08-11
- 发明人: Rodolfo Bovo , Paolo Molino
- 申请人： Rodolfo Bovo , Paolo Molino
- 申请人地址： IT Novara
- 专利权人： MEMC Electronics Materials S.p.A.
- 当前专利权人： MEMC Electronics Materials S.p.A.
- 当前专利权人地址： IT Novara
- 代理机构： Armstrong Teasdale LLP
- 主分类号： B24B49/12
- IPC分类号： B24B49/12 ; B24B41/06 ; B24B1/00 ; B24B19/00 ; B24B7/16
摘要：
A method for machining a profile into a silicon seed rod using a machine. The silicon seed rod is capable of being used in a chemical vapor deposition polysilicon reactor. The machine includes a plurality of grinding wheels. The method includes grinding a v-shaped profile into a first end of the silicon seed rod with one of the plurality of grinding wheels and grinding a conical profile in a second end of the silicon seed rod with another of the plurality of grinding wheels.
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