Invention Grant
US09108451B2 Photoresist film and manufacturing method for organic light emitting display device using the same
有权
光致抗蚀剂膜及使用其的有机发光显示装置的制造方法
- Patent Title: Photoresist film and manufacturing method for organic light emitting display device using the same
- Patent Title (中): 光致抗蚀剂膜及使用其的有机发光显示装置的制造方法
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Application No.: US13657988Application Date: 2012-10-23
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Publication No.: US09108451B2Publication Date: 2015-08-18
- Inventor: Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2012-0093762 20120827
- Main IPC: H01L21/00
- IPC: H01L21/00 ; B41M5/46 ; H01L51/56 ; H01L51/00
Abstract:
Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Public/Granted literature
- US20140057379A1 Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same Public/Granted day:2014-02-27
Information query
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