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公开(公告)号：US09304397B2
公开(公告)日：2016-04-05
申请号：US13727005
申请日：2012-12-26
Applicant: LG Display Co., Ltd.
Inventor： Wy-Yong Kim , Byung Chul Ahn , Gee Sung Chae , Jin Wuk Kim , Yoon Heung Tak
CPC classification number: G03F7/20 , G03F7/0035
Abstract: Disclosed is a method of manufacturing an organic light emitting display device. The method include forming a driving thin film transistor and passivation layer on a substrate, forming a bank layer at a boundary portion between adjacent sub-pixels, on the passivation layer, laminating a first photoresist film on the bank layer, forming a first photoresist pattern by irradiating IR light on the first photoresist film in an area except a first sub-pixel, depositing a first organic emission layer in the first sub-pixel area exposed by the first photoresist pattern, removing the first photoresist pattern, laminating a second photoresist film on the bank layer, forming a second photoresist pattern by irradiating IR light on the second photoresist film in an area except a second sub-pixel, depositing a second organic emission layer in the second sub-pixel area exposed by the second photoresist pattern, and removing the second photoresist pattern.
Abstract translation: 公开了一种制造有机发光显示装置的方法。 该方法包括在衬底上形成驱动薄膜晶体管和钝化层，在钝化层上在相邻子像素之间的边界部分形成堤层，在堤层上层叠第一光致抗蚀剂膜，形成第一光致抗蚀剂图案 通过在除了第一子像素以外的区域的第一光致抗蚀剂膜上照射IR光，在由第一光致抗蚀剂图案曝光的第一子像素区域中沉积第一有机发光层，去除第一光致抗蚀剂图案，层叠第二光致抗蚀剂膜 在所述堤层上，通过在除了第二子像素之外的区域中的所述第二光致抗蚀剂膜上照射IR光而形成第二光致抗蚀剂图案，在由所述第二光致抗蚀剂图案曝光的所述第二子像素区域中沉积第二有机发射层，以及 去除第二光致抗蚀剂图案。
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2.发明授权Photoresist film and manufacturing method for organic light emitting display device using the same 有权光致抗蚀剂膜及使用其的有机发光显示装置的制造方法公开(公告)号：US09108451B2
公开(公告)日：2015-08-18
申请号：US13657988
申请日：2012-10-23
Applicant: LG Display Co., Ltd.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Abstract translation: 公开了一种光致抗蚀剂膜，其包括在支撑膜上的光热转换层和在光 - 热转换层上的热响应性聚合物层，其中光致抗蚀剂膜容易通过温度从转印基板脱离 因为光致抗蚀剂膜包括热敏聚合物。
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公开(公告)号：US20140356992A1
公开(公告)日：2014-12-04
申请号：US14104404
申请日：2013-12-12
Applicant: LG DISPLAY CO., LTD.
Inventor： Jae Hyun Park , Jin Wuk Kim , Wy Yong Kim
CPC classification number: H01L51/56 , H01L27/3244 , H01L27/3246
Abstract: A manufacturing method of an organic light emitting display device is disclosed which includes: forming a thin film transistor on each sub-pixel region which is defined in a substrate; forming a passivation layer on the substrate provided with the thin film transistor; forming a first electrode of an organic light emitting diode in each sub-pixel region of the passivation layer; forming a bank pattern in boundaries of the sub-pixel region of the passivation layer; forming a photoresist pattern, which exposes a first sub-pixel region, on the bank pattern; forming an organic light emission layer on the first electrode within the first sub-pixel region and an organic material layer on the photoresist pattern by depositing an organic material on the entire surface of the substrate provided with the photoresist pattern; and removing the photoresist pattern and the organic material pattern using a detachment film.
Abstract translation: 公开了一种有机发光显示装置的制造方法，其包括：在限定在基板中的每个子像素区域上形成薄膜晶体管; 在设置有薄膜晶体管的基板上形成钝化层; 在钝化层的每个子像素区域中形成有机发光二极管的第一电极; 在所述钝化层的子像素区域的边界中形成堤形图案; 在所述堤岸图案上形成曝光第一子像素区域的光致抗蚀剂图案; 通过在设置有光致抗蚀剂图案的基板的整个表面上沉积有机材料，在第一子像素区域内的第一电极上形成有机发光层和光致抗蚀剂图案上的有机材料层; 并使用分离膜去除光致抗蚀剂图案和有机材料图案。
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Patent Agency Ranking
4.发明授权Composition of organic insulating layer and thin film transistor substrate and display device using the same 有权有机绝缘层和薄膜晶体管基板的组成及其使用的显示装置公开(公告)号：US08748894B2
公开(公告)日：2014-06-10
申请号：US13665668
申请日：2012-10-31
Applicant: LG Display Co., Ltd.
Inventor： Ju Hyuk Kim , Jin Wuk Kim , Joon Ki Kim , Na Young Song , Jae Chul Hwang , Song A Kim , Min Ho Jang , Jeong Beom Park
IPC: H01L29/04 , H01L31/20 , H01L31/036 , H01L31/0376
CPC classification number: H01L27/1248 , H01L23/293 , H01L2924/0002 , H01L2924/00
Abstract: Discussed is a composition of an organic insulating layer comprising a photosensitizer, a binder, an additive and a solvent, wherein the photosensitizer includes a photoacid generator (PAG), and a thin film transistor substrate and display device using the same, wherein the composition of the present invention enables to realize a simplified process by omitting an additional entire-surface exposing process for a color change, and a baking process after an exposing process; and to minimize a problem of color-coordinates shift by realizing a good light transmittance.
Abstract translation: 讨论了包含光敏剂，粘合剂，添加剂和溶剂的有机绝缘层的组合物，其中光敏剂包括光酸产生剂（PAG），以及薄膜晶体管基板和使用其的显示装置，其中， 本发明能够通过省略用于颜色变化的附加全表面曝光处理和曝光处理之后的烘焙处理来实现简化的处理; 并且通过实现良好的透光率来最小化色坐标移位的问题。
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5.发明授权公开(公告)号：US09625818B2
公开(公告)日：2017-04-18
申请号：US14808621
申请日：2015-07-24
Applicant: LG Display Co., Ltd.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
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6.发明申请Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same 审中-公开光致抗蚀剂薄膜及使用其的有机发光显示装置的制造方法公开(公告)号：US20150331320A1
公开(公告)日：2015-11-19
申请号：US14808621
申请日：2015-07-24
Applicant: LG Display Co., Ltd.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
IPC: G03F7/09
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Abstract translation: 公开了一种光致抗蚀剂膜，其包括在支撑膜上的光热转换层和在光 - 热转换层上的热响应性聚合物层，其中光致抗蚀剂膜容易通过温度从转印基板脱离 因为光致抗蚀剂膜包括热敏聚合物。
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7.发明申请Photoresist Film and Manufacturing Method for Organic Light Emitting Display Device Using the Same 有权光致抗蚀剂薄膜及使用其的有机发光显示装置的制造方法公开(公告)号：US20140057379A1
公开(公告)日：2014-02-27
申请号：US13657988
申请日：2012-10-23
Applicant: LG DISPLAY CO., LTD.
Inventor： Jae hyun Park , Jin Wuk Kim , Wy-Yong Kim , Hye Li Min , Min Jee Kim , Young tae Son , Young sub Shin
CPC classification number: G03F7/094 , B41M5/46 , B41M2205/06 , B41M2205/38 , H01L51/0013 , H01L51/56
Abstract: Disclosed is a photoresist film including a light-to-heat conversion layer on a support film, and a thermo-responsive polymer layer on the light-to-heat conversion layer, wherein the photoresist film is easily detached from a transfer substrate through a temperature adjustment and detach film since the photoresist film includes thermo-responsive polymer.
Abstract translation: 公开了一种光致抗蚀剂膜，其包括在支撑膜上的光热转换层和在光 - 热转换层上的热响应性聚合物层，其中光致抗蚀剂膜容易通过温度从转印基板脱离 因为光致抗蚀剂膜包括热敏聚合物。
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公开(公告)号：US09040320B2
公开(公告)日：2015-05-26
申请号：US14104404
申请日：2013-12-12
Applicant: LG DISPLAY CO., LTD.
Inventor： Jae Hyun Park , Jin Wuk Kim , Wy Yong Kim
CPC classification number: H01L51/56 , H01L27/3244 , H01L27/3246
Abstract: A manufacturing method of an organic light emitting display device is disclosed which includes: forming a thin film transistor on each sub-pixel region which is defined in a substrate; forming a passivation layer on the substrate provided with the thin film transistor; forming a first electrode of an organic light emitting diode in each sub-pixel region of the passivation layer; forming a bank pattern in boundaries of the sub-pixel region of the passivation layer; forming a photoresist pattern, which exposes a first sub-pixel region, on the bank pattern; forming an organic light emission layer on the first electrode within the first sub-pixel region and an organic material layer on the photoresist pattern by depositing an organic material on the entire surface of the substrate provided with the photoresist pattern; and removing the photoresist pattern and the organic material pattern using a detachment film.
Abstract translation: 公开了一种有机发光显示装置的制造方法，其包括：在限定在基板中的每个子像素区域上形成薄膜晶体管; 在设置有薄膜晶体管的基板上形成钝化层; 在钝化层的每个子像素区域中形成有机发光二极管的第一电极; 在所述钝化层的子像素区域的边界中形成堤形图案; 在所述堤岸图案上形成曝光第一子像素区域的光致抗蚀剂图案; 通过在设置有光致抗蚀剂图案的基板的整个表面上沉积有机材料，在第一子像素区域内的第一电极上形成有机发光层和光致抗蚀剂图案上的有机材料层; 并使用分离膜去除光致抗蚀剂图案和有机材料图案。
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