Invention Grant
- Patent Title: Variable resistance memory device and method of fabricating the same
- Patent Title (中): 可变电阻存储器件及其制造方法
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Application No.: US14328056Application Date: 2014-07-10
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Publication No.: US09118010B2Publication Date: 2015-08-25
- Inventor: Sanghyun Hong , Jaekyu Lee , Yong Kwan Kim
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2011-0046417 20110517
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/10 ; H01L27/24 ; H01L27/22

Abstract:
According to an example embodiment, a variable resistance memory device includes a lower electrode that includes a spacer-shaped first sub lower electrode and a second sub lower electrode covering a curved sidewall of the first sub lower electrode. The second sub lower electrode extends upward to protrude above the top of the first sub lower electrode. The lower electrode includes an upward-tapered shape.
Public/Granted literature
- US20140322888A1 VARIABLE RESISTANCE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME Public/Granted day:2014-10-30
Information query
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