发明授权
- 专利标题： Vacuum processing apparatus and processing method using the same
- 专利标题（中）： 真空处理装置及其处理方法
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申请号： US13325108申请日： 2011-12-14
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公开(公告)号： US09121099B2公开(公告)日： 2015-09-01
- 发明人: Kazuhiro Kameyama
- 申请人： Kazuhiro Kameyama
- 申请人地址： JP Kawasaki-Shi, Kanagawa-Ken
- 专利权人： CANON ANELVA CORPORATION
- 当前专利权人： CANON ANELVA CORPORATION
- 当前专利权人地址： JP Kawasaki-Shi, Kanagawa-Ken
- 代理机构： Buchanan Ingersoll & Rooney PC
- 优先权： JP2010-286275 20101222
- 主分类号： C23C16/52
- IPC分类号： C23C16/52 ; C23C14/56 ; C23C14/54
摘要：
A vacuum processing apparatus includes a process chamber; a transport unit for transporting a plurality of substrates; a gas supply unit; a substrate processing unit for processing the substrates placed on the transport unit; a detection unit for detecting a substrate interval between adjacent substrates out of the plurality of substrates; and a control unit for controlling, based on the substrate interval detected by the detection unit, a supply amount of the gas to be supplied by the gas supply unit.
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